The structural characterisation of HWCVD-deposited nanocrystalline silicon films
South African Journal of Science
| Field | Value | |
| Title | The structural characterisation of HWCVD-deposited nanocrystalline silicon films | |
| Creator | Swain, Bibhu P. | |
| Description | Nanocrystalline silicon (nc-Si) films were deposited by hot-wire chemical vapour deposition (HWCVD) in the presence of varying H2 concentrations and their structural and interfacial character investigated by X-ray diffraction, small-angle X-ray scattering (SAXS) and Raman spectroscopy. The crystalline fraction was around 30–50% and the nc-Si crystallite size was in the range 20–35 nm. The SAXS results were analysed by Guinier plot, scaling factor, and correlation distance. The nc-Si grains displayed a mass fractal appearance, and the interfacial inhomogeneity distance was ~2 nm. | |
| Publisher | AOSIS | |
| Date | 2010-01-19 | |
| Identifier | 10.4102/sajs.v105i1/2.41 | |
| Source | South African Journal of Science; Vol 105, No 1/2 (2009); 77 1996-7489 0038-2353 | |
| Language | eng | |
| Relation |
The following web links (URLs) may trigger a file download or direct you to an alternative webpage to gain access to a publication file format of the published article:
https://journals.sajs.aosis.co.za/index.php/sajs/article/view/41/30
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