The influence of deposition temperature on vanadium dioxide thin films microstructure and physical properties

South African Journal of Science

 
 
Field Value
 
Title The influence of deposition temperature on vanadium dioxide thin films microstructure and physical properties
 
Creator Msomi, Velaphi Nemraoui, Oaisin
 
Subject — deposition temperature; microstructure; thermochromism; thin films; vanadium dioxide
Description Vanadium dioxide thin films were successfully prepared on soda lime glass substrates using the optimised conditions for r.f-inverted cylindrical magnetron sputtering. The optimised deposition parameters were fixed and then a systematic study of the effect of deposition temperature, ranging from 450 °C to 550 °C, on the microstructure of thermochromic thin films was carried out. The deposited films were found to be well crystallised, showing strong texture corresponding to the (011) plane, indicating the presence of vanadium dioxide.
 
Publisher AOSIS
 
Contributor National Research Fund
Date 2010-11-18
 
Type info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion — —
Format text/html text/xml application/pdf
Identifier 10.4102/sajs.v106i11/12.297
 
Source South African Journal of Science; Vol 106, No 11/12 (2010); 4 pages 1996-7489 0038-2353
 
Language eng
 
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Rights Copyright (c) 2010 Velaphi Msomi, Oaisin Nemraoui https://creativecommons.org/licenses/by/4.0
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